Micromaterials. III: Microelement Fabrication Technology.

Fabrication Technology

Parallel nanogap fabrication with nanometer size control using III-V semiconductor epitaxial technology.

A nanogap fabrication process using strained epitaxial III-V beams is reported. The process is highly reproducible, allowing parallel fabrication and nanogap size control. The beams are fabricated from MBE-grown (GaAs/GaP)/AlGaAs strained heterostructures, standard e-beam lithography and wet etching. During the wet etching process, the relaxation of the accumulated stress at the epitaxial heter...

Fabrication technology of metal-cavity nanolasers in III-V membranes on silicon

Electrically pumped metal-cavity nanolasers in III-V semiconductors are promising for their application in optical interconnects, where high integration density and low optical powers are required. They offer a low threshold current and excellent cooling properties due to the metal encapsulation. In this contribution, an overview about the technology required for the fabrication of a nanolaser ...

Iii-n Technology

KnowMade KnowMade is specialized in analysis of patents and scientific information. We provide patent search, IP landscape, patent valuation, IP due diligence, scientific literature landscape, identification of technologies available for transfer/licensing/sale, alerts and updates. Our service offer consists of custom studies, analysis reports, on-demand tracking and strategy consulting. Knowma...

ITER first wall fabrication technology in China

China has done R&Ds on the fabrication technology for ITER first wall (FW). The FW materials, such as the vacuum-hot-pressing (VHP) Be and ITER-grade CuCrZr alloys, have been developed in China. The Be plate showed good physical and mechanical properties, similar to S65C. The effect of fabrication process on mechanical strength of CuCrZr alloy was studied. Several FW qualification (FWQ) mock-up...